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DoW STTR 2026 BAA Nanofabrication, dry etching, hard mask, etching selectivity, high-aspect-ratio, pattern transfer. Develop and demonstrate novel nanofabrication hard-mask materials that exhibit substantially improved plasma etch resistance, enabling the implementation of extreme high-aspect-ratio structures with excellent pattern-transfer fidelity, minimal sidewall roughness, and precise dimensional control. Proposed solutions should overcome the fundamental limitations of conventional lithography masks in a scalable fabrication environment by creating next-generation technologies capable of delivering high-resolution nanoscale features en…
Eligibility information: Not assessed — read the full SBIR/STTR solicitation.
Check full topic requirements, eligibility and amendments before deciding to respond. Use the opportunity-fit AI workflow and proposal requirements matrix to record evidence and unanswered questions. Calendar downloads are date-only reminders, not official submission times. The optional saved combined shortlist is separate from your funding-notice shortlist.
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